Nanowire lithography, IBM research

Nanowire lithography, IBM research

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Credit: IBM RESEARCH/SCIENCE PHOTO LIBRARY

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Caption: Nanowire lithography, IBM research. IBM scientist Hesham Ghoneim holding a silicon wafer with lithographically patterned gold pads on top. These are used to contact silicon nanowires. The silicon nanowires are grown via a VLS (Vapor-Liquid-Solid) process and then transferred on to the silicon wafer. Contact leads and gate electrodes are then written with electron beam lithography from the pre-patterned gold pads to the nanowire. Nanowires are a candidate technology for extending current computing capabilities. Photographed in June 2009, at IBM Research-Zurich, Switzerland.

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