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Plasma etching equipment making integrated circuit

Plasma etching equipment making integrated circuit

T380/0242

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Credit

ROSENFELD IMAGES LTD / SCIENCE PHOTO LIBRARY ROSENFELD IMAGES LTD / SCIENCE PHOTO LIBRARY

Caption

Chip manufacture. Production of silicon chips by plasma etching in four column-like reactors. Chips are made from a semiconductor, such as silicon, which is impregnated with certain impurities to make electronic components. During the etching process here, wafers of silicon are placed in a vapour or a plasma in an electric field. The ions in the vapour impregnate areas of the wafer which are left exposed. This process may be repeated several times whilst changing the ions and areas exposed. The development of integrated circuits has greatly reduced the size of electronic components.

Release details

Model release not required. Property release not required.

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