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Depositing a thin diamond film on silicon wafer

Depositing a thin diamond film on silicon wafer

T735/0032

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Credit

LAWRENCE LIVERMORE NATIONAL LABORATORY / SCIENCE PHOTO LIBRARY LAWRENCE LIVERMORE NATIONAL LABORATORY / SCIENCE PHOTO LIBRARY

Caption

Deposition of diamond on silicon. View into the vacuum chamber of a cathodic arc deposition device where a thin diamond film is applied to a silicon wafer. A current vapourises a graphite electrode, and the ionised carbon atoms produced are guided electrically to the object to be coated. In this case, a thin film of glassy amorphous diamond forms on the wafer. The wafer may then be used in an advanced flat panel electronic display screen. This may find applications in aircraft cockpits, computer systems and home entertainment products.

Release details

Model release not required. Property release not required.

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