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Nanopatterning equipment

Nanopatterning equipment

C020/8820

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Credit

IBM RESEARCH / SCIENCE PHOTO LIBRARY IBM RESEARCH / SCIENCE PHOTO LIBRARY

Caption

Nanopatterning equipment. Close-up of a silicon wafer (centre) being etched with a nanopatterning tool developed at the IBM Zurich Research Laboratory. A nano-sized heatable silicon tip, 100,000 times smaller than a sharpened pencil point, was used to etch a polymer (plastic) surface. A record-setting world's smallest magazine cover (11x14 micrometres) was created in April 2014, a Guinness World Record. This method is intended to prototype a new generation of technologies, from energy efficient transistors for computers to microscopic security tags to prevent the forgery of documents. Photographed on 15 April 2014.

Release details

Model release not required. Property release not required.

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