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Nanowire lithography, IBM research

Nanowire lithography, IBM research

C022/8534

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Credit

IBM RESEARCH / SCIENCE PHOTO LIBRARY IBM RESEARCH / SCIENCE PHOTO LIBRARY

Caption

Nanowire lithography, IBM research. Pieces of a silicon wafer with lithographically patterned gold pads on top, used to contact silicon nanowires. The silicon nanowires are grown via a VLS (Vapor-Liquid-Solid) process and then transferred on to the silicon wafer. Contact leads and gate electrodes are then written with electron beam lithography from the pre-patterned gold pads to the nanowire. Nanowires are a candidate technology for extending current computing capabilities. Photographed in June 2009, at IBM Research-Zurich, Switzerland.

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